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Open-source EUV lithography simulator in Python/PyTorch: Mo/Si mirror, thin-mask and RCWA mask diffraction, partially coherent imaging, chemically amplified resist (Dill, PEB, development) with stochastic LER/LWR, process window and calibration. Every physical default has a named source. Browser GUI and REST API. Apache-2.0.
The project implements state-of-the-art computational lithography algorithms used in semiconductor manufacturing, complete with educational documentation and working examples!